MODELING ASPECTS TO IMPROVE THE SOLUTION OF THE INVERSE PROBLEM IN SCATTEROMETRY
Gross H, Heidenreich S, Henn M-A, Bär Mcritical dimensions, uncertainty, lithography, scatterometry, inverse problem
| Document type | Article |
| Journal title / Source | Discrete and Continuous Dynamical Systems Series S |
| Peer-reviewed article | 1 |
| Volume | 8 |
| Issue | 3 |
| Page numbers / Article number | 497-519 |
| Publisher's name | American Institute of Mathematical Sciences |
| Publisher's address (city only) | Springfield, MO |
| Publication date | 2015-6 |
| ISSN | - |
| DOI | 10.3934/dcdss.2015.8.497 |
| Web URL | http://www.aimsciences.org/journals/displayArticlesnew.jsp?paperID=10417 |
| Language | English |