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Modelling Aspects in Optical Metrology IV

Metrology of small structures for the manufacturing of electronic and optical devices (IND17 Scatterometry), will provide a reference standard to add traceability to scatterometric measurements and make them comparable to microscopic methods. This is important for the optical and semiconductor industries as they depend on component miniaturisation and reliable measurements of small structures.

IND17 JRP-Partners and REG will present the results of the JRP at Modelling Aspects in Optical Metrology IV. The conference is organised as part of SPIE Optical Metrology 2013, which is co-located with LASER World of PHOTONICS 2013 in Munich, Germany. This conference is dedicated to establishing a forum to present and discuss particular basic methods, techniques, and algorithms which are necessary for the modelling and simulation of applied optical metrology techniques.

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Event Information

Date
2013-05-13 to 2013-05-14
Location
Munich, Germany
Categories
EMRP