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The optics and semiconductor industries use innovative materials and complex nanostructures whose optical properties are difficult to measure and often not accurately known.

Completed EMPIR project Traceable metrology of soft X-ray to IR optical constants and nanofilms for advanced manufacturing (20IND04, ATMOC) developed advanced mathematical methods to traceably characterise these materials for wavelengths ranging from soft x-ray (longer wavelength and lower energy than other x-rays) to infra-red. A database of optical constants was created, with associated uncertainties for bulk materials and ultra-thin film systems and industrially relevant datasets. This database provides the opportunity for relevant industries to run simulations and eventually develop new materials with tailored properties.

Project achievements:

Achievements from the project include:

• Good practice guide: Good practice guide on traceable reflectometry, Mueller ellipsometry and scatterometry as reliable and traceable thin-film metrology technique in the soft X-ray to IR spectral range (D4)
• Reference samples of ultra-thin layer systems, complex nanostructures and novel materials that are of interest to industry. These were measured using X-ray reflectivity, microreflectometry, and Mueller ellipsometry, and measurement results were presented in two reports:
  • Produced and metrologically pre-characterised optical response data, test and reference samples (D2) How to calculate uncertainty budgets for scatterometry, reflectometry and Mueller ellipsometry using reference materials (D3)
• Database of optical constants
• Datasets associated with the project
• Software package PyThia for computationally expensive models
• Video on the scatterometry technique: VSL scatterometry facilities and activities - VSL This was in conjunction with EMPIR projects 20IND07 TracOptic and 20FUN02 POLight
• Provided information for new standards for ellipsometry including German standards DIN 50989-5 and DIN 50989-6 as well as an international standard ISO 23131:2021
• Provided information for two more standards in this area awaiting publication:
  • ISO/FDIS 23131-2 - Ellipsometry — Part 2: Bulk material model
  • ISO/FDIS 23131-3 - Ellipsometry — Part 3: Transparent single layer model.

Project coordinator Sebastian Heidenreich from PTB said

‘ATMOC has significantly advanced the metrology for optical material properties, supporting the development of next-generation semiconductor technologies and strengthening Europe’s position as a leader in this strategic sector.’

This EMPIR project is co-funded by the European Union's Horizon 2020 research and innovation programme and the EMPIR Participating States.

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