A virtual lateral standard for AFM calibraion
Koops R., van Veghel M., van de Nes A.Nanoscale production; Lateral AFM calibration; Virtual standard; Traceability; Measurement uncertainty; Non-linearity
| Document type | Article |
| Journal title / Source | Microelectronic Engineering |
| Peer-reviewed article | 1 |
| Volume | 153 |
| Issue | 5 March 2016 |
| Page numbers / Article number | pp 29-36 |
| Publisher's name | Elsevier |
| Publication date | 2016-3-5 |
| DOI | 10.1016/j.mee.2016.01.010 |
| Language | English |