Joint Research on Scatterometry and AFM Wafer Metrology
Bodermann B., Buhr E., Danzebrink H.-U., Bär M., Scholze F., Krumrey M., Wurm M., Klapetek P., Hansen P.-E., Korpelainen V., van Veghel M., Yacoot A., Siitonen S., El Gawhary O., Burger S., Saastamoinen T.Scatterometry, CD metrology, AFM, reference standard, rigorous modelling, inverse diffraction problem
| Document type | Proceedings |
| Journal title / Source | AIP Conference Proceedings |
| Volume | 1395 |
| Issue | 319 (2011) |
| Publisher's name | American Institute of Physics |
| Publication date | 2011-11-10 |
| Conference name | International Conference on Frontiers of Characterisation and Metrology for Nanoelectronics FCMN 2011 |
| Conference date | 23-26 May 2011 |
| Conference place | Grenoble, France |
| DOI | 10.1063/1.3657910 |
| Language | English |