Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM
Scholze F., Soltwisch V., Dai G., Henn M.-A., Gross H.mask metrology, EUV lithography, CD metrology, line edge roughness, line width roughness
| Document type | Proceedings |
| Journal title / Source | Proc. of SPIE |
| Volume | 8880 |
| Publication date | 2013-9-9 |
| Conference name | Photomask Technology 2013 |
| Conference date | September 10, 2013 |
| Conference place | Monterey, California, United States |
| DOI | 10.1117/12.2025827 |
| Web URL | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1736337 |
| Language | English |