Determination of line profiles on photomasks using DUV, EUV and X-ray scattering
Scholze F., Bodermann B., Burger S., Endres J., Haase A., Krumrey M., Laubis C., Soltwisch V., Ullrich A., Wernecke J.scatterometry, GISAXS, EUV-scatterometry, line structure
| Document type | Proceedings |
| Journal title / Source | Proc SPIE |
| Volume | 9231 |
| Publication date | 2015 |
| Conference name | 30th European Mask and Lithography Conference |
| Conference date | June 24, 2014 |
| Conference place | Dresden, Germany |
| DOI | 10.1117/12.2065941 |
| Language | English |