Fast Simulation Method for Parameter Reconstruction in Optical Metrology
Burger S., Zschiedrich L., Pomplun J., Schmidt F., Bodermann B.Scatterometry, optical metrology, 3D rigorous electromagnetic field simulations, computational metrology, computational lithography, finite-element methods
Document type | Proceedings |
Journal title / Source | Proc SPIE |
Volume | 8681 |
Publication date | 2015 |
Conference name | SPIE Metrology, Inspection, and Process Control for Microlithography XXVII |
Conference date | February 24, 2013 |
Conference place | San Jose, California, United States |
DOI | 10.1117/12.2011154 |
Language | English |