Investigations of the influence of common approximations in scatterometry for dimensional nanometrology
Endres J., Diener A., Wurm M., Bodermann B.scatterometry, nanometrology, linewidth, critical dimension, grating
| Document type | Article |
| Journal title / Source | Measurement Science and Technology |
| Volume | 25 |
| Issue | 4 |
| Publication date | 2014-3-5 |
| DOI | 10.1088/0957-0233/25/4/044004 |
| Web URL | http://iopscience.iop.org/0957-0233/25/4/044004/ |
| Language | English |