Perspectives on Black Silicon in Semiconductor Manufacturing: Experimental Comparison of Plasma Etching, MACE, and Fs-Laser Etching
Liu X., Radfar B., Chen K., Setala O.E., Pasanen T.P., Yli-Koski M., Savin H., Vahanissi V.etching, laser ablation, nanotechnology, optoelectronic devices, photolithography, silicon
| Document type | Article |
| Journal title / Source | IEEE Transactions on Semiconductor Manufacturing |
| Volume | 35 |
| Issue | 3 |
| Page numbers / Article number | 504-510 |
| Publisher's name | Institute of Electrical and Electronics Engineers (IEEE) |
| Publisher's address (city only) | Piscataway, NJ, United States |
| Publication date | 2022-8 |
| ISSN | 0894-6507, 1558-2345 |
| DOI | 10.1109/TSM.2022.3190630 |
| Language | English |