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Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation

Lohr Leonhard M., Ciesielski Richard, Glabisch Sven, Schröder Sophia, Brose Sascha, Soltwisch Victor
Keywords:

grating characterization, EUV scatterometry, soft x-ray,

Document type Article
Journal title / Source Applied Optics
Volume 62
Issue 1
Page numbers / Article number 117
Publisher's name Optica Publishing Group
Publisher's address (city only) Washington, DC, United States
Publication date 2022-12-19
ISSN 1559-128X, 2155-3165
DOI 10.1364/AO.475566
Language English

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