D5.3 - Electrical Characterization of the SiO2/4H-SiC Interface
Nanjappan C., Pfusterschmied G., Schmid U.Siliconcarbide, thermal oxidation, plasma oxidation, TEOS, interface, defect density
| Document type | Proceedings |
| Journal title / Source | SMSI 2023 Conference |
| Volume | Lectures |
| Issue | D5.3 |
| Page numbers / Article number | 235 - 236 |
| Publisher's name | AMA Service GmbH, Von-Münchhausen-Str. 49, 31515 Wunstorf, Germany |
| Publisher's address (city only) | Wunstorf, Lower Saxony, Germany |
| Publication date | 2023-5 |
| Conference name | SMSI 2023 |
| Conference date | 08-05-2023 to 11-05-2023 |
| Conference place | Nürnberg |
| ISSN | 978-3-9819376-8-8 |
| DOI | 10.5162/SMSI2023/D5.3 |
| ISBN | 978-3-9819376-8-8 |
| Web URL | https://www.ama-science.org/proceedings/details/4427 |
| Language | English |