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Fabrication of quantum emitters in aluminum nitride by Al-ion implantation and thermal annealing

Nieto Hernández E., Yağcı H. B., Pugliese V., Aprà P., Cannon J. K., Bishop S. G., Hadden J., Ditalia Tchernij S., Olivero P., Bennett A. J., Forneris J.
Keywords:

Semiconductors, Confocal microscopy, Crystallographic defects, Annealing, Ion implantation, Optical properties, Photoluminescence spectroscopy, Photons, Nitrides, Photoemission

Document type Article
Journal title / Source Applied Physics Letters
Volume 124
Issue 12
Page numbers / Article number 124003
Publisher's name AIP Publishing
Publisher's address (city only) Melville, NY, United States
Publication date 2024-3-18
ISSN 0003-6951, 1077-3118
DOI 10.1063/5.0185534
Language English

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