Impact of Line Edge Roughness on ReRAM Uniformity and Scaling
Constantoudis V., Papavieros G., Karakolis P., Khiat A., Prodromakis T., Korpelainen V., Dimitrakis P.Resistive Random Access Memory (ReRAM); Line Edge Roughness (LER); variability; uniformity; modeling; lithography
| Document type | Article |
| Journal title / Source | Materials |
| Volume | 12 |
| Issue | 23 |
| Page numbers / Article number | 3972 |
| Publisher's name | MDPI AG |
| Publication date | 2019-11 |
| ISSN | 1996-1944 |
| DOI | 10.3390/ma12233972 |
| Language | English |