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Multilevel effective material approximation for modeling ellipsometric measurements on complex porous thin films

Sachse R., Hodoroaba V-D., Kraehnert R., Hertwig A.
Keywords:

Mueller Ellipsometry, thin film metrology, modelling

Document type Article
Journal title / Source Advanced Optical Technologies
Volume 11
Issue 3-4
Page numbers / Article number 137-147
Publisher's name Frontiers Media SA
Publisher's address (city only) Lausanne, Switzerland
Publication date 2022-6-22
ISSN 2192-8576, 2192-8584
DOI 10.1515/aot-2022-0007
Language English

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