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The effect of line roughness on DUV scatterometry.

Henn M.-A., Heidenreich S., Groß H., Bodermann B., Baer M.
Keywords:

Scatterometry, Optical metrology, Line edge roughness

Document type Proceedings
Journal title / Source Proc SPIE
Volume 8789
Publication date 2015
Conference name SPIE Modelling Aspects in Optical Metrology IV
Conference date May 13, 2013
Conference place Munich, Germany
DOI 10.1117/12.2020761
Language English

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Information

Name of Call / Funding Programme
EMRP A169: Call 2010 Industry