The effect of line roughness on DUV scatterometry.
Henn M.-A., Heidenreich S., Groß H., Bodermann B., Baer M.Scatterometry, Optical metrology, Line edge roughness
Document type | Proceedings |
Journal title / Source | Proc SPIE |
Volume | 8789 |
Publication date | 2015 |
Conference name | SPIE Modelling Aspects in Optical Metrology IV |
Conference date | May 13, 2013 |
Conference place | Munich, Germany |
DOI | 10.1117/12.2020761 |
Language | English |