A CuBHT‐Graphene van der Waals Heterostructure with Strong Interlayer Coupling for Highly Efficient Photoinduced Charge Separation
Wang Z., Fu S., Zhang W., Liang B., Liu T‐J, Hambsch M., Pöhls J.F., Wu Y., Zhang J., Lan T., Li X., Qi H., Polozij M., Mannsfeld S.C. B., Kaiser U., Bonn M., Weitz R.T, Heine T., Parkin S.S.P., Wang H.I., Dong R., Feng X.Heterostructures, Interlayer Coupling,Photoinduced Charge Separation
| Document type | Article |
| Journal title / Source | Advanced Materials |
| Volume | 36 |
| Issue | 21 |
| Publisher's name | Wiley |
| Publisher's address (city only) | Hoboken, NJ, United States |
| Publication date | 2024-3 |
| ISSN | 0935-9648, 1521-4095 |
| DOI | 10.1002/adma.202311454 |
| Language | English |