Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion
Hammerschmidt M, Weiser M, Garcia Santiago X, Zschiedrich L, Bodermann B, Burger Scomputational metrology, optical metrology, computational lithography, nanolithography, finite-element methods, nanooptics
| Document type | Proceedings |
| Journal title / Source | Proc. SPIE |
| Volume | 10330 |
| Page numbers / Article number | 1033004 |
| Publication date | 2017 |
| Conference name | Modeling Aspects in Optical Metrology VI |
| Conference date | 25-06-2017 to 29-06-2017 |
| Conference place | Munich |
| DOI | 10.1117/12.2270596 |
| Web URL | https://arxiv.org/pdf/1707.08467 |
| Language | English |